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    • 专利摘要:
    The invention relates to a system and method for generating laser pulses of high power and very high speed laser. According to the invention, the laser system comprises an oscillator (1) capable of generating a source laser beam comprising a series of source pulses (100) of femtosecond or picosecond duration at a first repetition frequency (F1) greater than or equal to 800 megahertz and an optical amplifier system (2) adapted to receive and amplify the source pulse series (100) at a second repetition frequency (F2) equal to or greater than the first repetition frequency (F1), the multiple being a number a natural number greater than or equal to two, so as to generate a series of laser pulses of very high repetition frequency.
    公开号:FR3076959A1
    申请号:FR1850249
    申请日:2018-01-12
    公开日:2019-07-19
    发明作者:Clemens Honninger；Eric Audouard
    申请人:Amplitude Systemes SA；
    IPC主号:
    专利说明:

    Technical field to which the invention relates
    The present invention relates generally to the field of pulsed lasers.
    It relates more particularly to a laser system with ultra-short pulses and of high power.
    It relates in particular to a system and a method for generating ultra-short laser pulses, of high power and having a modular repetition frequency.
    TECHNOLOGICAL BACKGROUND
    The frequency or repetition frequency of the pulses emitted by a pulsed laser is often determined according to the architecture used and the specifications desired for the laser beam.
    A master power amplifier oscillator (or ΜΟΡΑ for Master Oscillator Power Amplifier) architecture is commonly used to produce high power laser sources. In this case, a source called the master oscillator generates a source signal consisting of source pulses. This source signal is amplified in an optical amplifier system comprising one or more amplification stages in series. There are different types of sources. The source can be impulse, in particular a source based on a mode-blocking laser, the length of the oscillator cavity of which defines a repetition frequency. A pulse source can also be based on a Q-switched oscillator.
    In some applications, the user may need to increase the power of the incident laser beam while maintaining the ultra-short duration and energy of the laser pulses.
    An increase in the repetition frequency of the pulses can make it possible to increase the power of the laser beam but at the expense of the energy per pulse (see the publication Can Kerse et al., “3.5 GHz intra-burst repetition rate ultrafast Yb-doped fiber laser ”, Optics Communication 366, 2016, 404-409).
    It is desirable to develop a laser system capable of generating high power laser pulses with very high energy and / or very high rate for industrial applications.
    In general, it is desirable to increase the peak power available in a pulse laser source while limiting the number of optical amplifiers.
    In particular, it is desirable to develop a laser system generating high power and high energy laser pulses, from a hundred nJ to a few tens of pJ, at a modular repetition frequency, which can range from one pulse to demand. to a train of pulses of very high rate, or even one or more bursts of pulses with a modular duration for each burst and / or between successive bursts.
    Object of the invention
    In order to overcome the aforementioned drawbacks of the prior art, the present invention provides a very high rate laser system.
    More particularly, according to the invention, a very high rate laser system is proposed, comprising a mode lock oscillator capable of generating a source laser beam comprising a series of source pulses of femtosecond or picosecond duration at a first repeat frequency F1 greater than or equal to 800 megahertz, and an optical amplifier system adapted to receive and amplify the series of source pulses at a second repetition frequency equal to or multiple of the first repetition frequency F1, the multiple being a natural integer greater than or equal to two , so as to generate a series of laser pulses of very high repetition frequency.
    According to a particular and advantageous embodiment, the laser system further comprises a repetition frequency multiplier device disposed between the oscillator and the optical amplifier system, the repetition frequency multiplier device comprising a first optical coupler-splitter, a first optical delay line and a second optical coupler-separator having a first output, the first optical coupler-separator being adapted to spatially separate the source laser beam into a first beam of pulses at the first repetition frequency and a second beam of pulses at the first repetition frequency, the first optical delay line being disposed between the first optical coupler-splitter and second optical coupler-splitter on a path of the second pulse beam at the first repetition frequency, the first delay line optics being adapted p or inducing an optical delay equal to half a period of the first repetition frequency on the second pulse beam and generating a second pulse beam delayed by half a period, and the second optical coupler-separator being adapted for recombine the first beam and the second beam delayed by half a period and form on the first output a first recombined beam in which the pulses are clocked at the second repetition frequency equal to twice the first repetition frequency.
    Advantageously, the second optical coupler-separator has a second output, the second optical coupler-separator being adapted to form on the second output a second recombined beam comprising pulses at the second repetition frequency equal to twice the first frequency of repetition, the first recombined beam and the second recombined beam being synchronized with each other at the output of the second optical splitter coupler.
    According to a variant of this embodiment, the repetition frequency multiplier device comprises a second optical delay line and an optical combiner having a first output, the second optical delay line being disposed between the second optical coupler-separator and the combiner optic on a path of the second recombined beam, the second optical delay line being adapted to induce an optical delay equal to a quarter period of the first repetition frequency on the second recombined beam and generate a second pulse beam delayed by a quarter period, and the optical combiner being adapted to recombine the first recombined beam and the second pulse beam delayed by a quarter period and form on its first output a first beam quadrupled in repetition frequency comprising pulses at the second repetition frequency equal to four times the first 1st repetition frequency.
    Advantageously, the optical combiner has a second output, the optical combiner being adapted to form on its second output a second beam quadrupled in repetition frequency comprising pulses at the second repetition frequency equal to four times the first repetition frequency, the first beam quadrupled in repetition frequency and the second beam quadrupled in repetition frequency being synchronized with each other at the output of the optical combiner.
    According to a particular and advantageous aspect, the first optical splitter-coupler, the second optical splitter-splitter and, respectively, the optical combiner are polarizing or polarization maintaining couplers, and further comprising a polarizing device suitable for combining the first recombined beam and the second recombined beam or, respectively, the first beam quadrupled in frequency of repetition and the second beam quadrupled in frequency of repetition.
    According to another particular and advantageous aspect, the laser system further comprises a pulse compressor arranged on the first output of the second optical coupler-separator and / or another pulse compressor disposed on the second output of the second optical coupler-separator .
    According to yet another particular and advantageous aspect, the laser system further comprises a pulse compressor disposed on the first output of the optical combiner and / or another pulse compressor disposed on the second output of the optical combiner.
    Other non-limiting and advantageous characteristics of the laser system according to the invention, taken individually or in any technically possible combination, are the following:
    - the mode-locked oscillator is chosen from: a semiconductor oscillator or a solid-state oscillator, for example operating in soliton regime, a heavily doped fiber oscillator with a length between 7 cm and 10 cm, or a hybrid oscillator fiber / solid state with a very short, highly doped fiber, between 7 cm and 10 cm in length as fiber active medium;
    the optical amplifier system comprises an optical amplifier or a plurality of optical amplifiers chosen from the following types of optical amplifiers: active optical fiber amplifier and / or crystal amplifier;
    - the crystal amplifier is of the bar, plate (slab) or thin disk type;
    - The optical amplifier system comprises a plurality of optical amplifiers arranged in cascade, the plurality of optical amplifiers comprising a power optical amplifier;
    the laser system furthermore comprises a pulse selector disposed downstream of the oscillator and upstream of the optical amplifier system or, respectively, of the optical power amplifier, the pulse selector being adapted to select and / or amplitude modulating a burst of pulses and injecting the burst of pulses into the optical amplifier system or, respectively, into the optical power amplifier;
    - the laser system also optionally includes another source adapted to generate a beam of pulses complementary to the burst of pulses and another coupler arranged so as to receive and combine the secondary beam and the burst of source pulses in one composite pulse beam having a repetition frequency equal to the intra-burst repetition frequency of the pulse burst, the other coupler being adapted to inject the composite pulse beam into the optical amplifier system or into the amplifier power optics;
    - The laser system further comprises an optical modulator arranged downstream of the optical amplifier system, the optical modulator being adapted to select a burst or a plurality of bursts of amplified pulses and / or to modulate in amplitude the burst or the plurality of bursts of amplified pulses.
    The invention also provides a method for generating very high rate laser pulses comprising the following steps:
    generation of a series of source pulses of femtosecond or picosecond duration by an oscillator having a first repetition frequency greater than or equal to 800 megahertz, and
    - optical amplification of the series of source pulses at a second repetition frequency equal to or multiple of the first repetition frequency (F1), the multiple being a natural whole number greater than or equal to two, so as to generate a series of very high rate laser pulses.
    Detailed description of an exemplary embodiment
    The description which follows with reference to the appended drawings, given by way of nonlimiting examples, will make it clear what the invention consists of and how it can be carried out.
    In the accompanying drawings:
    - Figure 1 schematically shows a laser system according to the invention based on an oscillator at very high speed;
    - Figure 2 schematically illustrates an embodiment of a femtosecond laser oscillator operating at very high speed;
    - Figure 3 schematically illustrates another embodiment of a femtosecond laser oscillator operating at very high speed;
    - Figure 4 schematically shows a laser system according to a first embodiment of the invention based on an oscillator at very high speed;
    - Figure 5 schematically shows a laser system according to a second embodiment further comprising a pulse selector;
    - Figure 6 schematically shows a laser system according to a third embodiment comprising an inversion stabilization device of the optical power amplifier system;
    - Figure 7 shows schematically the structure of a repetition frequency doubler intended to be used in combination with one of the embodiments;
    - Figure 8 schematically shows the structure of a repetition frequency multiplier by a factor of 4 intended to be used in combination with one of the embodiments of the invention;
    - Figure 9 illustrates an example of source pulses from an oscillator at very high cadence;
    - Figures 10-11 illustrate an example of generation of bursts of high energy laser pulses at very high rate.
    Device and Method
    In FIG. 1, the main components of a laser system based on a blocked mode oscillator 1 operating at high speed close to the GHz, a passive optical fiber 5, a first monolithic subsystem have been represented in the form of a block diagram. 17 with active optical fiber and another optical subsystem 18 operating in free space.
    In the present document, the term active optical fiber means a doped optical fiber used as an optical amplifying medium, for example an optical fiber doped with rare earth. Passive optical fiber is understood to be an generally undoped optical fiber which is not used as an optical amplifying medium and which has mainly a transmission function.
    In a conventional pulse laser system, an oscillator based on active optical fiber is generally used which operates at a repetition frequency of the order of 100 MHz and in any case less than 500 MHz. A fiber oscillator in this frequency range corresponds to a cavity having a length of at least 20 cm to integrate all the functions necessary for the operation of the oscillator.
    Oscillator 1 is here a femtosecond (or picosecond) oscillator which generates ultrashort source pulses 100 at a first repetition frequency, denoted F1. We choose an oscillator operating at a first repetition frequency, F1, which is greater than or equal to 500 MHz and preferably greater than or equal to 800 MHz or even greater than or equal to 1 GHz.
    Oscillator 1 is preferably a mode lock oscillator. In one example, oscillator 1 is a semiconductor-based oscillator (of the VCSEL type) or a solid-state oscillator operating in soliton regime. In another variant, the oscillator 1 is a hybrid oscillator comprising elements in free space and an optical fiber a few cm long, heavily doped.
    Oscillator 1 generates ultrashort source pulses 100 which are of low energy, of the order of 1 to 100 pJ per pulse. This energy level per pulse is much lower than the energy required to reach the ablation threshold for solid materials such as glass, semiconductor or metal, which is above one hundred mJ / cm 2
    An oscillator based on binary or ternary semiconductor compounds, for example InGaAs, InP or InGaP, of the VCSEL type makes it possible to easily tune the wavelength of the source pulses over a wide spectral band compatible with an active optical fiber amplifier doped with ytterbium. operating at a wavelength of ~ 1030 nm and / or with an erbium doped active optical fiber amplifier operating at a wavelength of ~ 1500 nm, or even a thulium or holmium doped active optical amplifier operating at a wavelength of ~ 2000 nm. In addition, a VCSEL type oscillator is adapted to operate in a repetition frequency range up to 10 GHz or 20 GHz.
    The first monolithic active optical fiber subsystem 17 comprises for example an amplifier system 2 with active optical fiber, comprising for example a preamplifier with active optical fiber and optionally one or more amplifiers with active optical fiber for power.
    Advantageously, the first subsystem 17 further comprises a pulse selector 3 and / or a pulse stretcher 6 and / or an optical isolator 7, disposed between the active optical preamplifier and the or power active optical fiber amplifiers. The pulse stretcher 6 preferably consists of a passive optical fiber of suitable length or of: chirped Bragg gratings or else of optical fiber with specific dispersion (bandgap fiber).
    The other optical subsystem 18 comprises for example an optical isolator, possibly an optical power amplifier, a pulse compressor 8 and / or an optical modulator 9. In known manner, the pulse compressor 8 makes it possible to recompress the pulses drawn in the stretcher 6 of the first subsystem 17 upstream of the optical power amplification. The optical modulator 9 has an optical gate function, it makes it possible to select one or more output pulse trains.
    The laser system of FIG. 1 makes it possible to generate a train of femtosecond laser pulses 900 at a repetition frequency greater than or equal to gigahertz (GHz) or a train of bursts of femtosecond laser pulses at a higher intra-burst repetition frequency or equal to gigahertz (GHz) and to an inter-burst repetition frequency for example of 100 Hz, or of 100 kHz, or even of the order of MHz or more.
    FIG. 2 shows a detailed example of a blocked mode oscillator configuration with a high repetition rate. The blocked mode oscillator 1 comprises a pump 11, an input optical system 12, a resonant optical cavity comprising mirrors M1, M2, M3, M4 and M5, a laser active medium 10 disposed in the resonant optical cavity and a optical output system 13. Preferably, the active laser medium 10 consists of a laser crystal having a thickness equal for example to 10 mm. The active laser medium 10 is for example made up of a passive solid matrix (glass, YAG, KGW, fiber, etc.) and an active dopant based on rare earth ions, most often ytterbium or erbium, thulium or holmium. The optical length of a round trip in the resonant cavity is about 15 cm. A very heavily doped and very short crystal or active fiber of approximately 7 cm to 10 cm in maximum length makes it possible to considerably reduce the optical length of the resonant cavity, defined by the actual length divided by the optical index of the crystal or , respectively, of the active fiber, by comparison with an active medium based on relatively less doped active optical fiber, and thus to manufacture a laser oscillator having by construction a very high first repetition frequency F1. The term “very heavily doped crystal or optical fiber” is understood here to mean a crystal or an optical fiber doped with active ions such that the absorption length at the pump wavelength is significantly less than the length of the crystal or optical fiber (by a factor of 1 or 2). In practice, in this case, the absorption length is less than a few cm.
    In an exemplary embodiment, the active laser medium 10 is placed in the air. According to a variant, the active laser medium 10 is a crystal which is fixed by two blocks of glass or non-doped crystal to the two end mirrors of the resonant cavity to form a monolithic structure without air.
    The pump diode 11 generates continuous or almost continuous pump radiation 111. The optical input system 12 injects pump radiation 111 into the resonant optical cavity along the longitudinal optical axis 19 of the cavity through the mirror M2. The mirror M2 is transparent to pump radiation 111. The optical input system 12 is for example a lens optical system. The optical input system 12 focuses the pump radiation 111 in an active laser medium 10. The active laser medium 10 emits a source laser beam. The mirrors M1, M2, M4 and M5 are reflective for the source laser beam. The M5 mirror has a saturable absorbent semiconductor to initiate and maintain the mode blocking effect. The mirror M3 is partially reflecting and partially transparent to the source laser beam.
    In an exemplary embodiment, the distance L1 between the optical input system 12 and the active laser medium 10 is approximately 60 mm, the distance L2 between the center of the concave mirror M2 and one face of the crystal forming the active laser medium 10 is approximately 15 mm, the distance L3 between the center of the concave mirror M1 and the other face of the active laser crystal 10 is approximately 15 mm, the distance between the concave mirror M1 and the mirror M4 is approximately 66 mm, the distance between the mirror M4 and the mirror M5 is approximately 15 mm and the distance between the concave mirror M2 and the mirror M3 is approximately 60 mm. The physical length of the cavity is approximately 170 mm. The repetition frequency F1 is then 880 MHz, the repetition period of approximately 1.1 ns.
    In known manner, the resonant optical cavity is configured to operate in blocked mode so as to generate at the output of the resonant optical cavity a source laser beam comprising a train of source pulses 100 of femtosecond duration at a first repetition frequency (F1) greater than or equal to 800 megahertz (MHz). The output optical system 13 injects the pulse source laser beam into the passive optical fiber 5.
    The passive optical fiber 5 injects the pulse source laser beam into the first monolithic subsystem 17. The optical amplifier system 2 amplifies the source pulses 100 and forms laser pulses at the first repetition frequency (F1). Advantageously, the pulse selector 3 selects several pulses forming a burst of pulses having an intra-burst repetition frequency equal to the first repetition frequency (F1). Alternatively, the pulse selector 3 selects several bursts of pulses. In a particular embodiment, the pulse selector 3 selects a determined number of pulses to create one or more bursts of pulses.
    FIG. 3 shows another detailed example of a blocked mode oscillator configuration with a high repetition rate. The same reference signs designate the same elements as in Figures 1-2. In the configuration of FIG. 3, the resonant optical cavity comprises only the active laser medium 10, a mirror M1, a mirror M2 and a mirror M3. The length of the cavity illustrated in FIG. 3 is smaller than that illustrated in FIG. 2. The configuration in FIG. 3 thus makes it possible to obtain a higher first repetition frequency F1, for example greater than 1 GHz.
    FIG. 4 shows a laser system comprising an oscillator 1 and an optical amplifier system 2.
    The optical amplifier system 2 comprises an optical amplifier or several optical amplifiers arranged in cascade. The optical amplifier system 2 consists of one or more active optical fiber amplifier (s) and / or crystal amplifier (s) and / or a hybrid amplifier system. In this document, hybrid amplifier system means a system comprising a combination of at least one fiber amplifier and at least one crystal amplifier. For example, the optical amplifier system 2 comprises a first optical amplifier 21 or preamplifier, a second optical amplifier 22 and an Nth optical amplifier 2N. The optical amplifiers 22, ..., 2N are, for example, optical power amplifiers.
    In the first embodiment illustrated in FIG. 4, the oscillator 1 generates a source laser beam comprising a series of source pulses 100 at the first repetition frequency F1. The optical amplifier system 2 receives the series of source pulses 100 and amplifies them to form a series of laser pulses 200 at the first repetition frequency F1. This first embodiment makes it possible to generate laser pulses 200 at a very high first repetition frequency F1. However, since the average power is limited by the optical amplifier system 2, the energy of each laser pulse 200 is then limited by the very high repetition frequency F1. In an exemplary embodiment, we consider an oscillator 1 generating source pulses of duration ~ 250 fs at a first repetition frequency F1 of 880 MHz combined with an optical amplifier system 2 comprising a passive fiber stretcher, a single-mode fiber preamplifier and a wide-core single-mode fiber amplifier. The average output power of the optical amplifier system 2 is of the order of 20 W. In this case, the laser pulses 200 are separated in time by 1.1 ns and the energy E is limited to approximately a few tens of nanojoules per laser pulse 200 on the output S, which can reach the microjoule for average powers of the order of kW. This energy level per pulse is much higher than that at the output of the oscillator 1. However, this energy level is generally insufficient to exceed the ablation threshold of a solid material 8 such as glass, a semiconductor or a metal, but may be suitable for a material with a low ablation threshold such as a polymer.
    However, it seems that the ablation efficiency is not only dependent on the energy per laser pulse. Thus, the application of ultra-short laser pulses of relatively limited energy and at a very high repetition frequency F1 can make it possible to obtain a so-called ablation-cooled material removal effect and to significantly increase the material ablation efficiency.
    In FIGS. 5 to 8, the same reference signs designate elements identical or analogous to those of FIGS. 1-4.
    In the second embodiment, illustrated in FIG. 5, a pulse selector 3 (or picker picker in English terminology) is disposed between the preamplifier 21 and the power amplifiers 22, 2N. In the event that the oscillator 1 delivers sufficient power (for example greater than 50 mW), the pulse selector 3 can also be placed between the oscillator 1 and the preamplifier 21.
    The preamplifier 21 receives the source pulses 100 at the first repetition frequency F1 and amplifies them to form preamplified pulses 210 at the first repetition frequency F1.
    The pulse selector 3 includes an optical modulator of the electro-optical or acousto-optical type. Pulse selector 3 receives the preamplified pulses 210. Pulse selector 3 selects a burst of M pulses 300, where M is a natural integer generally between 1 and 1000, or between 50 and 500 pulses and preferably between 50 and 200 pulses. Pulse selector 3 can operate in pulse on demand mode, in pulse on demand burst mode or in periodic burst mode at a third repetition frequency, denoted F3, between 100 Hz and 10 MHz, up to '' at 100 MHz. The time interval between two bursts may vary depending on the application. This variation in repetition frequency can modify the gain dynamics in the amplifiers and lead to a variation of the energy per pulse. In one example, the pulse selector 3 operates with a reduced duty cycle, less than 50%, and preferably less than 30% or even less than 20%. In a particular embodiment, the pulse selector 3 operates by periodically selecting bursts of M = 80 pulses, at a third repetition frequency F3 equal to ~ 2 MHz and with a duty cycle of 18%.
    In this document, the cyclic ratio of a burst is understood to mean the ratio between the duration of a burst over the time interval between two successive bursts.
    At the output of the pulse selector 3, the pulses 300 thus have an intra-burst repetition frequency equal to the first repetition frequency F1. The pulse selector 3 can select a single burst of pulses or several successive bursts of pulses, with a determined time interval between two successive bursts. In a particular embodiment, the pulse selector 3 selects periodic bursts with a constant time interval between successive bursts. In other words, the pulse selector 3 can operate with an inter-burst repetition frequency equal to the third repetition frequency F3.
    According to a particular embodiment, the pulse selector 3 is controlled to modulate the amplitude of the pulses in a burst of pulses, according to an envelope defined by the user. For example, pulse selector 3 applies a niche selection to a burst of pulses (or top hat, in English terminology). Thus, the pulses of the selected burst all have the same amplitude. Alternatively, the pulse selector 3 applies amplitude modulation with a rising edge, a plateau and a falling edge. In this case, the pulses of the selected burst have an increasing amplitude, then constant, then decreasing. According to another alternative, the pulse selector 3 applies a sawtooth amplitude modulation, for example maximum for the first pulse of the burst then decreasing for the following pulses. Those skilled in the art will easily adapt the profile of the amplitude modulation of the pulse selector 3 according to the applications.
    The burst of M pulses 300 is injected into the optical amplifiers 22, ..., 2N of power. Thus, the optical amplifier system 2 delivers on output S a burst of laser pulses 500 having an intra-burst repetition frequency equal to the first repetition frequency F1, and an inter-burst repetition frequency equal to the third frequency of repetition F3. The optical power amplifiers 22, ..., 2N deliver the same average power as a pulse train at the first repetition frequency F1, but on a limited number M of pulses. Consequently, the amplified pulses 500 of a burst have an energy per pulse greater than the energy of the pulses of a train of pulses at the first repetition frequency F1, amplified by the same optical amplifier system 2. In the case of a niche-shaped burst (top-hat), the energy of a burst is then equal to the power divided by the third repetition frequency F3 and the energy per pulse in the burst is equal to the energy of this burst divided by the number of pulses M in the burst.
    Thus, each pulse of the burst is amplified to reach an energy between 10 nJ and a few pJ depending on the application. The second embodiment thus makes it possible to increase the energy per pulse, without reducing the first intra-burst repetition frequency F1.
    In addition, the energy of a burst of pulses is equal to the sum of the energies of each pulse of the burst. Let us consider on the one hand a burst of ~ 80 pulses fs or ps, the burst of pulses having a duration of the order of a nanosecond and, on the other hand, a laser pulse of nanosecond duration having the same energy as the integrated energy of the burst of pulses fs or ps considered. However, since the duration of each pulse in the burst is femtosecond or picosecond, the peak power of the pulse burst is much greater than the peak power of the nanosecond pulse. Pulse burst mode allows energy to be distributed over time very differently from a nanosecond single pulse. The laser-matter interactions are greatly modified.
    Thus, the second embodiment makes it possible to increase the peak power available. The number of pulses in a burst is selected given the limitations of the optical amplifier system.
    However, it seems that the ablation efficiency of a solid material by pulse laser depends not only on the energy per pulse, on the pulse duration but also, in burst mode, on the frequency of intra-burst and cyclic repetition of bursts of amplified pulses. Thus, the application of a burst of ultra-short laser pulses of relatively limited energy and at very high frequency of intra-burst repetition, F1, can make it possible to obtain the ablation-cooled material removal effect. ) and to increase the ablation efficiency of the material, that is to say to increase the amount of material removed.
    According to a variant, the laser system also comprises an optical modulator 9 of the electro-optical or acousto-optical type disposed at the output of the optical amplifier system 2. The optical modulator 9 can be used in a system not comprising a pulse selector 3, illustrated for example in FIG. 4. Alternatively, the optical modulator 9 is used in a system comprising a pulse selector 3, illustrated for example in FIGS. 5-6. The optical modulator 9 is controlled to modulate the amplitude of the amplified pulses, according to an envelope defined by the user. For example, the optical modulator 9 applies a niche selection to a burst of amplified pulses. Thus, the amplified pulses of the selected burst all have the same amplitude. Alternatively, the pulse selector 3 applies amplitude modulation with a rising edge, a plateau and a falling edge. In this case, the amplified pulses of the selected burst have an increasing amplitude, then constant, then decreasing. According to another alternative, the optical modulator 9 applies a sawtooth amplitude modulation, for example maximum for the first pulse of the burst then decreasing for the following pulses. A person skilled in the art will easily adapt the profile of the amplitude modulation of the optical modulator 9 according to the applications.
    However, the second embodiment can have drawbacks for optical power amplifiers 22, ... 2N. Indeed, the variation of the period between two bursts is likely to introduce gain instabilities.
    In order to stabilize the inversion level and the gain of the optical power amplifiers, a third embodiment is proposed illustrated in FIG. 6. The third embodiment also comprises another source 14, adapted to generate a secondary signal 40 , complementary to the burst of M pulses 300.
    A coupler 15 makes it possible to combine the burst of M pulses 300 and the secondary signal 40 at the input of the optical power amplifier (s).
    At the output of the optical amplifier system 2, a coupler-separator makes it possible to spatially separate on the one hand, the burst of M amplified pulses 500, and, on the other hand, the amplified secondary signal 400.
    More precisely, one places oneself in conditions where the secondary signal 40 is configured so as to maintain in the optical power amplifier (s) 22, ..., 2N the population inversion exactly at the level necessary to amplify the next burst of M pulses chosen by the user at the desired energy level. More specifically, the secondary signal 40 is temporally modulated so that the energy stored in the optical power amplifier system 22, 2N remains at the level necessary to amplify the next burst of M pulses 300 to the desired level of energy. Generally, the pulses of the burst of pulses and of the secondary signal 40 do not have the same duration and / or the same energy. However, the secondary signal 40 is dimensioned so that, the combination of the burst of M pulses 300 and the secondary signal 40 has the effect of maintaining the population inversion level of the optical amplifier 22, ... , 2N at the value necessary to extract the desired burst energy with the next burst of M pulses 300. Thus, when the secondary signal 40 is temporally modulated so that the corresponding time interval is greater than the time interval separating two bursts of M pulses 300, the gain of the optical amplifier system 22, ..., 2N remains constant for each pulse of the burst of M amplified pulses 500. When a main signal consisting of a burst of M pulses 300 selected is sent to the optical power amplifier 22, ..., 2N, after a modulation which removes one or more source pulses, all the selected pulses from the rafa the of M pulses 300 are amplified with the same gain.
    In practice, the energy of the pulses of the burst of M amplified pulses 300 is measured as a function of time and the power, energy, wavelength and / or duration of the pulses of the secondary signal 40 injected are modified. so as to stabilize the energy of the pulses of the burst of M amplified pulses 300.
    Thus, the optical power amplifiers 22, 2N simultaneously amplify the burst of pulses 30 selected by the pulse selector 3 and the secondary signal 40.
    Advantageously, the burst of pulses 30 and the secondary signal 40 have a mutually transverse polarization state. In this case, the coupler 19 and the coupler-separator 16 can be based on polarizing optical components.
    In a variant, the burst of pulses 30 and the secondary signal 40 have different wavelengths, located in the passband of the optical amplifier system 2. In this variant, the coupler 15 and the splitter coupler 16 can be based on dichroic optical components.
    The third embodiment thus makes it possible to stabilize the optical power amplifiers in burst mode. As an option, the laser system also includes an optical modulator 9 disposed at the output of the splitter coupler 16 so as to modulate the amplitude of the burst of M amplified pulses 500.
    In another embodiment, the use of a high repetition frequency oscillator, an optical amplifier system and a repetition frequency multiplier is combined.
    We know from the document Can Kerse et al. (“3.5 GHz intra-burst repeat rate ultrafast Yb-doped fiber laser”, Optics Communication 366, 2016, 404-409) a fiber amplifier system generating bursts of laser pulses at an intra-burst repetition frequency of 3.5 GHz and a burst repeat frequency of 1 kHz. The following analysis is part of this disclosure. This type ΜΟΡΑ (Master Oscillator Power Amplifier) system includes a laser oscillator emitting laser source pulses at a source repetition frequency of 108 MHz, a repetition frequency multiplier device 4 with passive optical fiber and a fiber amplifier system. active optics. More specifically, the repetition frequency multiplier device 4 comprises six couplers 50-50 arranged in series, five optical delay lines, each optical delay line being disposed between two consecutive 50-50 couplers. This repetition frequency multiplier device 4 makes it possible to multiply the source repetition frequency by a factor equal to 2 5 thus increasing the source repetition frequency from 108 MHz to 3.5 GHz. This system also uses a pre-amplifier, an acousto-optic modulator and 9 stages of fiber optic amplifiers. The acousto-optic modulator applies an envelope determining the shape of the bursts of pulses at a repetition frequency of 1 kHz. The bursts of pulses are then amplified in the 9 stages of fiber optic amplifiers. However, this system requires many cascading components. In addition, a drawback of this technique is the difficulty of maintaining the stability in energy and in temporal spacing of the output pulses, in particular because of asymmetries between the branches of the couplers 50-50. On the other hand, such a system seems difficult to exploit in a repetition frequency range greater than 3.5 GHz, which would require additional couplers, additional delay lines of very high precision and additional amplifier stages.
    Figures 7-8 illustrate a particular aspect which can be combined with one of the embodiments described above. This particular aspect relates to a repetition frequency multiplier device by a factor 2 or 4. This repetition frequency multiplier device is intended to be preferably placed between the oscillator 1 and the optical amplifier system 2. According to a variant, the device repetition frequency multiplier is arranged between the optical preamplifier and the optical power amplifier system. According to another variant, the repetition frequency multiplier device is arranged at the output of the optical amplifier system 2.
    More specifically, FIG. 7 illustrates a repetition frequency multiplier 4 by a factor of two or repetition frequency doubler. The repetition frequency multiplier 4 comprises a first optical coupler-coupler 41, a first optical delay line 51 and a second optical coupler-separator 42. The first optical delay line 51 is disposed between the first optical coupler-separator 41 and the second optical coupler-separator 42. The repetition frequency multiplier 4 receives a laser beam 100, 200, 500 comprising laser pulses at the first repetition frequency F1, each laser pulse having an energy per pulse denoted E. The first coupler-separator optic 41 is adapted to spatially separate the laser beam 100, 200 or 500 into a first pulse beam 110 having an energy per pulse equal to E / 2 clocked at the first repetition frequency F1 and a second pulse beam 120 having an energy per pulse equal to E / 2 clocked at the first repetition frequency F1. The first optical delay line 51 is arranged between the first optical splitter coupler 41 and the second optical coupler-splitter 42 on a path of the second pulse beam 120. The first optical delay line 51 is adapted to induce an optical delay equal to a half-period of the first repetition frequency F1 on the second pulse beam 120 so as to form a second pulse beam 130 temporally delayed by a half period relative to the first pulse beam 110. The second optical splitter coupler 42 receives the first pulse beam 110 at the first repetition frequency F1 and the second pulse beam 130, delayed by half a period at the first repetition frequency F1. The optical delay line 51 is for example constituted by a passive optical fiber of suitable length. The second optical coupler-separator 42 is for example an optical coupler with 4 input-outputs. The second optical coupler-separator 42 is suitable for recombining the first beam 110 and the second beam 130 delayed by half a period and for forming on a first output S1 a first recombined beam 142 in which the pulses have an energy per pulse equal to E / 4 and are clocked at a second repetition frequency F2 equal to twice the first repetition frequency F1. In a particularly advantageous manner, the second optical coupler-separator 42 can be adapted to recombine the first beam 110 and the second beam 130 delayed by half a period and form on a second output S2 a second recombined beam 152 in which the pulses have an energy per pulse equal to E / 4 and are clocked at the second repetition frequency F2 equal to twice the first repetition frequency F1. Advantageously, the first optical coupler-separator 41 and the second optical coupler-separator 42 are 50/50 couplers.
    Thus, the repetition frequency multiplier 4 makes it possible to generate a pulse beam 142 having a repetition frequency F2 multiplied by a factor 2 with respect to F1, in which the energy per pulse is only divided by four. Starting from a source oscillator having a first repetition frequency F1 of 800 MHz, one thus obtains a recombined beam 142 and / or 152 having a repetition frequency of 2 x 800 MHz = 1.6 GHz. This configuration also makes it possible to limit the number of optical amplifiers in order to obtain energy per well adapted to the etching of the material considered.
    One of the two outputs S1 or S2 is generally used to amplify the pulse beam at the repetition frequency twice the repetition frequency of the source oscillator in the optical amplifier system. Indeed, in most optical amplifier systems, the amplification must be carried out along a single optical axis. In this case, the useful output power of this repetition frequency multiplier device is approximately half of the input power P, not counting the insertion losses of the repetition frequency multiplier device.
    FIG. 8 illustrates another example of a frequency multiplier and more precisely a repetition frequency multiplier 44 by a factor 4 or repetition frequency quadruple. The same reference signs designate the same elements as in FIG. 7. The repetition frequency multiplier 44 further comprises an optical combiner 49 and a second optical delay line 52. The second optical delay line 52 is disposed between the second optical coupler-separator 42 and the optical combiner 49. Advantageously, the second optical coupler-separator 42 has four input-output. The second optical coupler-separator 42 receives on an input the first pulse beam 110 at the first repetition frequency F1 having an energy per pulse E / 2 and on another input the second pulse beam 130 delayed in time by half-period at the first repetition frequency F1 and having an energy per well E / 2. As explained in connection with FIG. 7, the second optical coupler-separator 42 is adapted to recombine the first pulse beam 110 and the second delayed pulse beam 130 and to separate them spatially into a first recombined beam 142 having an energy per draw equal to E / 4 clocked at twice the first repeat frequency (2xF1) and a second recombined beam 152 having an energy per draw equal to E / 4 clocked double the first repeat frequency (2xF1). The second optical delay line 52 is arranged on a path of the second recombined beam 152. The second optical delay line 52 is adapted to induce an optical delay equal to a quarter period of the first repetition frequency F1 on the second recombined beam 152 so as to form a second pulse beam 162 temporally delayed by a quarter of a period relative to the first recombined beam 142. The optical combiner 49 receives the first recombined beam 142 clocked at twice the first repetition frequency (2xF1) and the second pulse beam 162 temporally delayed by a quarter of the repetition frequency F1 and clocked at twice the first repetition frequency (2xF1). The optical combiner 49 is adapted to recombine the first recombined beam 142 and the second pulse beam 162 temporally delayed by a quarter of a period and to form on the first output S1 a first beam 170 quadrupled in frequency in which the pulses have a energy per pulse equal to E / 8 and are clocked at a second repetition frequency F2 equal to four times the first repetition frequency F1. In a particularly advantageous manner, the optical combiner 49 can be adapted to recombine the first split beam 142 and the other split beam 162 and form on the second output S2 a second beam 180 quadrupled in frequency in which the pulses have an energy per equal draw at E / 8 and are clocked at the second repetition frequency F2 equal to four times the first repetition frequency F1. Advantageously, the optical combiner 49 is a 50/50 coupler.
    Thus, the repetition frequency multiplier 44 makes it possible to generate at least one pulse beam 170, 180 having a second repetition frequency F2 multiplied by a factor 4 with respect to F1, in which the energy per pulse is only divided by eight. Starting from a source oscillator having a first repetition frequency F1 of 800 MHz, one thus obtains a recombined beam having a repetition frequency of 4 x 800 MHz = 3.2 GHz.
    Thus, the repetition frequency can be multiplied by a factor 2 or 4. The insertion losses of the components to be added (delay lines 51, 52 and 50/50 combiners) remain limited by the small number of components. Thus, it is chosen to limit the repetition frequency multiplier to a repetition frequency doubler or quadruple in order to limit the number of optical splitter couplers 41, 42, optical combiner 49 and optical delay lines 51, 52.
    The useful output power of this quadruple repetition frequency device is approximately half of the input power P, as in the case of the repetition frequency doubler, without counting the insertion losses of the repetition frequency multiplier device, or a power comparable to that obtained with a repeater frequency doubling device.
    In general, oscillator 1 is linearly polarized. Consequently, the source pulses 100, the amplified pulses 200, and, respectively, the pulses of a burst of pulses 500 are linearly polarized.
    In one embodiment, the first optical coupler-separator 41, the second optical coupler-separator 42 and the optical combiner 49 are isotropic couplers, which do not affect the state of polarization of the input or output signals. Alternatively, the first optical coupler-separator 41, the second optical coupler-separator 42 and the optical combiner 49 are polarizing or polarization maintaining couplers (PM). In this case, these couplers are configured and oriented so as not to change the polarization of the polarized input signals and to provide a separation ratio of 50/50 for the polarization of the input signal. This configuration can be used cleverly in isotropic amplifier systems or having the same amplification factors along the two axes of polarization. In fact, the first beam 170 quadrupled in frequency on the first output S1 and the second beam 180 quadrupled in frequency on the second output S2 can be used simultaneously. For example, a half-wave plate is used to rotate the polarization of the first beam 170 quadrupled in frequency or of the second beam 180 quadrupled in frequency and a polarizer to 90 degrees and to combine the two polarizations. The recombined beam can then be amplified in an isotropic optical amplifier or in a chain of isotropic optical amplifiers. The energy losses, located at the input of the amplifier chain, have only a limited impact on the final energy of the device.
    Alternatively, the second recombined beam 180 can be used on the second output S2 to amplify it in another similar optical amplifier system arranged in parallel so as to have two almost identical and synchronous GHz sources.
    According to another alternative, the first recombined beam 142 and the second pulse beam 162 are delayed temporally by a quarter of a period before recombining them. It is then possible to use simultaneously the first beam 170 quadrupled in frequency on the first output S1 and the second beam 180 quadrupled in frequency on the second output S2. Advantageously, there is a pulse compressor only on the first output S1, so as to obtain pulses at the same repetition frequency, but having different pulse durations on the first output S1 and on the second output S2 . These pulses of different duration are advantageously spatially recombined, with or without predetermined lateral offset, on the same sample.
    In a particular application, the first recombined beam 170 is used on the first output S1 and the second recombined beam 180 on the second output S2 for an in situ diagnosis according to a pumpsonde configuration.
    In cases where the optimal rate for machining a material is higher than the rate of the source oscillator, the temporal separation and recombination solution can be applied, with a significantly reduced complexity thanks to an oscillator rate already very high source. For example, starting from an oscillator at 500MHz (period of 2ns between each pulse), a rate of approximately 1 GHz can be achieved with a separation of the 50/50 pulses, an optical delay line to delay one of the pulses by a half period and a recombination device. Recombination can either be done spatially or by polarization. Polarization recombination can be achieved essentially without loss of power, but the well-defined polarization state will be lost. Spatial recombination can be carried out for example via a 50/50 coupler. This recombination is only possible by sacrificing power, because 50% of the incident light leaves on the first output S1 and 50% on the second output S2. However, this method remains preferred thanks to its flexibility. The loss of 50% in the very low power part of the laser system can be accepted without significant impact on the performance of the complete laser system.
    The optical delay line (s) 51, 52 are all the more difficult to control when the output repetition frequency is high. In practice, the repetition frequency multiplier device makes it possible to reach a repetition frequency of up to 10 GHz or more.
    The repetition frequency multiplier device advantageously makes it possible to have two outputs S1, S2 each delivering a beam of laser pulses at the same repetition frequency. Such a device allows pump-probe laser applications by using the first outlet to form, for example, a so-called pump laser beam and the first outlet to form a so-called probe laser beam.
    The source oscillator 1 having a very high rate makes it possible to limit the number of separations and recombination to 2 or 4, while accessing a repetition frequency in the multi-GHz domain. A laser system is thus obtained generating ultra-short pulses at a second repetition frequency F2 in the GHz domain.
    As detailed above, it is also possible to generate a burst of pulses having an intra-burst repetition frequency in the GHz domain, by using a pulse selector 3. It is thus possible to generate periodic bursts of pulses having an intra-burst repetition frequency in the GHz domain and an inter-burst repetition frequency between 100 Hz and 100 MHz. The pulses have a GHz rate and a power of between approximately 1 W and 1000 W, and preferably of the order of some 10 to 100 W.
    According to one embodiment, the pulse selector 3 is arranged upstream of the repetition frequency multiplier 4 or 44. In this case, the separation between two pulses incident on the pulse selector 3 is sufficiently large (approximately 1 to 2 ns) to allow pulse-to-pulse control with very good contrast. The pulse selector 3 thus selects a determined number of pulses. The repetition frequency multiplier 4, 44 then generates a burst of pulses comprising a multiple of the number of pulses selected by the pulse selector, the burst having a quasi-flat (or tophat) shape.
    In a variant that can be combined with any of the embodiments described above, another optical modulator 9 is arranged downstream of the repetition frequency multiplier 4 or 44. The optical modulator 9 is of acousto-optic or electro-optic type with analog amplitude control. The optical modulator 9 makes it possible to modulate the amplitude of the output pulses or to select bursts of pulses. The period between two pulses incident on the optical modulator 9 is then reduced by a factor of two or four compared to the period of the source pulses. In this case, the optical modulator 9 is likely to be too slow to select a slot-shaped burst (or top-hat) when the rise time of the optical modulator 9 is greater than the period between two pulses incident on the modulator optics 9.
    FIG. 9 illustrates a measurement of a source pulse beam 100 at the output of a mode-locked laser oscillator as shown in FIG. 2 or 3. The mode-locked laser oscillator generates source pulses having a first repeat frequency F1 of ~ 900 MHz. The period between two successive laser pulses is around 1.1 ns. The pulse duration is around 200 fs. The pulse duration can be shorter, for example of the order of 100 fs or even less than 100 fs.
    Figures 10-11 illustrate an example of generation of bursts of high energy laser pulses at very high rate from the source pulses of Figure 9. A laser system is used as shown schematically in Figure 5. Figure 10 shows a burst of about 80 pulses from the oscillator and amplified in an active fiber optic amplifier system. FIG. 11 shows a series of bursts of laser pulses with an inter-burst repetition frequency of 2 MHz, a duty cycle of approximately 18%, the power output of the active optical fiber amplifier system being of the order of 20W, and the duration of the amplified pulses of ~ 200fs.
    A pulse laser system according to one of the embodiments described above finds numerous applications, in particular in the ablation of solid materials such as glass, a semiconductor such as for example silicon or a metal such as for example copper, aluminum or stainless steel. Polymeric or biological materials (cornea, dentin, ...) can also be subjected to such laser treatment.
    The invention finds in particular applications for the ablation of various solid materials at a rate of the order of GHz or greater than 1 GHz, or even greater than 10 GHz or 20 GHz, in order to obtain a so-called cooled ablation.
    Such a laser system increases productivity while maintaining the quality of ablation and the precision of femtosecond (or picosecond) machining. Indeed, this laser system makes it possible to optimize the deposition of energy in matter, by generating a burst having an intrarafal repetition frequency (or second repetition frequency F2) greater than GHz. In addition, the laser system makes it possible to control the deposition of energy in the material by the successive supply of energy of M pulses at very high rate in a burst, possibly in a train of pulses at lower rate. Finally, the laser system makes it possible to control and optimize the energy deposition as a function of the material with which one wishes to interact by adapting the following different parameters: cadence of the pulses in a burst (or time difference between the pulses in the burst) , number of pulses in a burst and / or cadence of the pulse train.
    The laser system of the invention is suitable for demanding industrial applications in terms of robustness and reliability. In addition, the laser system is particularly compact, since it is based essentially on space-saving components (bar, plate or thin disc amplifier crystal) and / or fiber optic components.
    The method of generating laser pulses with a repetition frequency beyond the GHz is in particular suitable for implementing an increase in the efficiency of ablation of solid materials by laser.
    权利要求:
    Claims (15)
    [1" id="c-fr-0001]
    1. Very high rate laser system characterized in that it comprises:
    a mode lock oscillator (1) capable of generating a source laser beam comprising a series of source pulses (100) of femtosecond or picosecond duration at a first repetition frequency (F1) greater than or equal to 800 megahertz, and
    - an optical amplifier system (2) adapted to receive and amplify the series of source pulses (100) at a second repetition frequency (F2) equal to or multiple of the first repetition frequency (F1), the multiple being an integer natural greater than or equal to two, so as to generate a series of laser pulses of very high repetition frequency.
    [2" id="c-fr-0002]
    2. The laser system according to claim 1, further comprising a repetition frequency multiplier device (4, 44) disposed between the oscillator (1) and the optical amplifier system (2), the repetition frequency multiplier device (4, 44) comprising a first optical splitter-coupler (41), a first optical delay line (51) and a second optical splitter-coupler (42) having a first output (S1), the first optical splitter-coupler (41) being adapted to spatially separate the source laser beam (100) in a first pulse beam (110) at the first repeat frequency (F1) and a second pulse beam (120) at the first repeat frequency (F1), the first line to optical delay (51) being disposed between the first optical coupler-separator (41) and second optical coupler-coupler (42) on a path of the second pulse beam (120) at the first frequency of re petition (F1), the first optical delay line (51) being adapted to induce an optical delay equal to half a period of the first repetition frequency (F1) on the second pulse beam (120) and generate a second pulse beam delayed by half a period (130), and the second optical coupler-separator (42) being adapted to recombine the first beam (110) and the second beam delayed by half a period (130) and forming on the first output (S1) a first recombined beam (142) in which the pulses are clocked at the second repetition frequency (F2) equal to twice the first repetition frequency (F1).
    [3" id="c-fr-0003]
    3. The laser system as claimed in claim 2, in which the second optical coupler-separator (42) has a second outlet (S2), the second optical coupler-separator (42) being adapted to form a second outlet (S2) recombined beam (152) comprising pulses at the second repetition frequency (F2) equal to twice the first repetition frequency (F1), the first recombined beam (142) and the second recombined beam (152) being synchronized with one another output of the second optical splitter coupler (42).
    [4" id="c-fr-0004]
    4. The laser system according to claim 3, in which the repetition frequency multiplier device (44) comprises a second optical delay line (52) and an optical combiner (49) having a first output (S1), the second delay line. optical (52) being disposed between the second optical splitter coupler (42) and the optical combiner (49) on a path of the second recombined beam (152), the second optical delay line (52) being adapted to induce an optical delay equal to a quarter period of the first repetition frequency (F1) on the second recombined beam (152) and generating a second pulse beam delayed by a quarter period (162), and the optical combiner (49) being adapted for recombine the first recombined beam (142) and the second pulse beam delayed by a quarter period (162) and form on its first output (S1) a first beam quadrupled in repetition frequency (170) comprising pulses at the second repetition frequency (F2) equal to four times the first repetition frequency (F1).
    [5" id="c-fr-0005]
    5. The laser system as claimed in claim 4, in which the optical combiner (49) has a second output (S2), the optical combiner (49) being adapted to form on its second output (S2) a second beam quadrupled in repetition frequency. (180) comprising pulses at the second repetition frequency (F2) equal to four times the first repetition frequency (F1), the first beam quadrupled in repetition frequency (170) and the second beam quadrupled in repetition frequency (180 ) being synchronized with each other at the output of the optical combiner (49).
    [6" id="c-fr-0006]
    6. The laser system as claimed in claim 3 or, respectively, in which the first optical coupler-separator (41), the second optical coupler-coupler (42) and, respectively, the optical combiner (49) are polarizing or retaining couplers. polarization, and further comprising a polarizing device adapted to combine the first recombined beam (142) and the second recombined beam (152) or, respectively, the first beam quadrupled in repetition frequency (170) and the second beam quadrupled in frequency of repetition (180).
    [7" id="c-fr-0007]
    7. The laser system according to claim 3, further comprising a pulse compressor (8) disposed on the first outlet (S1) of the second optical coupler-separator (42) and / or another pulse compressor disposed on the second outlet. (S2) of the second optical coupler-separator (42).
    [8" id="c-fr-0008]
    8. The laser system according to claim 5 further comprising a pulse compressor (8) disposed on the first output (S1) of the optical combiner (49) and / or another pulse compressor (8) disposed on the second output (S2) of the optical combiner (49).
    [9" id="c-fr-0009]
    9. Laser system according to one of claims 1 to 8 in which the mode lock oscillator (1) is chosen from: a semiconductor oscillator or a solid state oscillator, a hybrid oscillator or a fiber optic oscillator having a doped optical fiber between 7 cm and 10 cm in length.
    [10" id="c-fr-0010]
    10. Laser system according to one of claims 1 to 9 wherein the optical amplifier system (2) comprises an optical amplifier (21) or a plurality of optical amplifiers (21, 22, 2N) chosen from the types of amplifiers following optics: active optical fiber amplifier and / or crystal amplifier.
    [11" id="c-fr-0011]
    11. Laser system according to one of claims 1 to 10 wherein the optical amplifier system (2) comprises a plurality of optical amplifiers (21,22, 2N) arranged in cascade, the plurality of optical amplifiers (21, 22 ,
    2N) comprising an optical power amplifier.
    [12" id="c-fr-0012]
    12. Laser system according to one of claims 1 to 11 further comprising a pulse selector (3) disposed downstream of the oscillator (1) and upstream of the optical amplifier system (2) or, respectively, of the optical power amplifier (22, 2N), the pulse selector (3) being adapted to select and / or amplitude modulate a burst of pulses (30) and inject the burst of pulses into the optical amplifier system ( 2) or, respectively, in the optical power amplifier (22, 2N).
    [13" id="c-fr-0013]
    13. The laser system according to claim 12, further comprising another source (14) adapted to generate a beam of complementary pulses (40) of the burst of pulses (30) and another coupler (15) arranged so as to receive and combining the secondary beam and the source pulse burst into a composite pulse beam having a repetition frequency equal to an intra-burst repetition frequency of the pulse burst, the other coupler (15) being adapted to inject the composite pulse beam into the optical amplifier system (2) or into the optical power amplifier (22, 2N).
    [14" id="c-fr-0014]
    14. Laser system according to one of claims 1 to 13 further comprising an optical modulator (9) disposed downstream of the optical amplifier system (2), the optical modulator (9) being adapted to select a burst or a plurality of bursts of amplified pulses (200) and / or for amplitude modulating the burst or the plurality of bursts of amplified pulses.
    [15" id="c-fr-0015]
    15. Method for generating very high rate laser pulses, comprising the following steps:
    - generation of a series of source pulses (100) of femtosecond or picosecond duration by an oscillator (1) having a first repetition frequency (F1) greater than or equal to 800 megahertz, and
    - optical amplification of the series of source pulses at a second repetition frequency (F2) equal to or multiple of the first repetition frequency (F1), the multiple being a natural whole number greater than or equal to two, so as to generate a series of laser pulses (140, 150, 170, 180) of very high rate.
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    同族专利:
    公开号 | 公开日
    US20200343682A1|2020-10-29|
    WO2019138192A1|2019-07-18|
    EP3738180B1|2021-12-29|
    FR3076959B1|2020-07-17|
    KR20200104875A|2020-09-04|
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    EP3738180A1|2020-11-18|
    JP2021510930A|2021-04-30|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    US20140050235A1|2010-11-24|2014-02-20|Fianum, Ltd.|Optical Systems|
    SI25975A|2020-02-27|2021-08-31|Univerza V Ljubljani|A hybrid laser for generating laser pulses on demand with constant energy and a method of generating said pulses|
    KR102298715B1|2020-03-09|2021-09-06|한국기계연구원|Fiber-based high repetition rate femtosecond laser source and laser processing system including the same|
    CN112652939A|2020-12-22|2021-04-13|武汉菩济医疗科技有限公司|Optical cable type ultrafast optical fiber laser|
    法律状态:
    2018-12-03| PLFP| Fee payment|Year of fee payment: 2 |
    2019-07-19| PLSC| Publication of the preliminary search report|Effective date: 20190719 |
    2019-12-02| PLFP| Fee payment|Year of fee payment: 3 |
    2020-12-02| PLFP| Fee payment|Year of fee payment: 4 |
    2021-12-01| PLFP| Fee payment|Year of fee payment: 5 |
    优先权:
    申请号 | 申请日 | 专利标题
    FR1850249|2018-01-12|
    FR1850249A|FR3076959B1|2018-01-12|2018-01-12|LASER SYSTEM AND METHOD FOR GENERATING VERY HIGH THROUGHPUT LASER PULSES|FR1850249A| FR3076959B1|2018-01-12|2018-01-12|LASER SYSTEM AND METHOD FOR GENERATING VERY HIGH THROUGHPUT LASER PULSES|
    KR1020207020114A| KR20200104875A|2018-01-12|2019-01-10|Laser system and method for generating very high repetition rate laser pulses|
    US16/961,510| US20200343682A1|2018-01-12|2019-01-10|Laser system and method for generating laser pulses with very high repetition rate|
    JP2020537459A| JP2021510930A|2018-01-12|2019-01-10|Laser systems and methods for generating laser pulses with extremely high repetition rates|
    EP19703399.6A| EP3738180B8|2018-01-12|2019-01-10|Laser system and method for generating laser pulses with very high repetition rate|
    CN201980018235.4A| CN111869019A|2018-01-12|2019-01-10|Laser system and method for generating laser pulses with very high repetition rate|
    PCT/FR2019/050051| WO2019138192A1|2018-01-12|2019-01-10|Laser system and method for generating laser pulses with very high repetition rate|
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